S. O. Akintunde, P. A. Selyshchev and D. O. Kehinde (2025) “Growth Kinetics of Refractory Metal Silicide under Radiation Induced Interstitial Mechanism: An Analytical Approach”, BIMA JOURNAL OF SCIENCE AND TECHNOLOGY (2536-6041), 9(1B), pp. 274-282. Available at: https://www.journals.gjbeacademia.com/index.php/bimajst/article/view/958 (Accessed: 1June2025).